Semiconductor processing gas diffuser plate

Details Semiconductor processing gas diffuser plate Semiconductor processing gas diffuser plate

1990-04-24

1992-08-04

Yuen, Henry C.

Heating

Work chamber having heating means

Having means by which work is progressed or moved mechanically

432253, 432 11, F27B 904, C23C 1600

Patent

active

051353911

ABSTRACT:
Disclosed is a baffle apparatus for insertion into a semiconductor wafer processing furnace to diffuse processing gases that are injected into the furnace by an injector nozzle. The baffle apparatus comprises: a diffuser plate assembly having an upper end and a lower end, the diffuser plate assembly having at least one diffuser plate against which injected gases are to be forced; and the lower end of the diffuser plate assembly being sized and shaped to engage with and be supported by an elongated wafer paddle.

REFERENCES:
patent: 4459104 (1984-07-01), Wollmann
patent: 4911638 (1990-03-01), Bayne et al.
patent: 5024599 (1991-06-01), Chhabra

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