Positive photoresist compositions with o-quinone diazide, novola

Details Positive photoresist compositions with o-quinone diazide, novola Positive photoresist compositions with o-quinone diazide, novola

1991-10-08

1992-09-01

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430166, 430191, 430192, 430193, 430326, 430330, 430331, G03F 7023, G03C 160, G03C 176

Patent

active

051438143

ABSTRACT:
The invention provides a method for producing a positive working photosensitive element with increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl phenol resin, at least one o-quinone diazide and a propylene glycol alkyl ether acetate on a substrate, drying, exposing to imaging energy and developing.

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