Exposure apparatus

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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Details

2504931, 25049222, H01K 126, H01J 3700

Patent

active

054303036

ABSTRACT:
An exposure apparatus comprises a light source emitting light of the ultraviolet region; an illuminating system for introducing the light from the light source into a mask bearing a predetermined pattern; an exposure unit for forming the image of the mask pattern on a photosensitive substrate; a chamber accommodating the light source, the illuminating system and the exposure unit; and an impurity eliminating device for eliminating at least an organic impurity inducing a photochemical reaction with the light of the ultraviolet region.

REFERENCES:
patent: 4665315 (1987-05-01), Bacchetti
patent: 5146098 (1992-09-01), Stack
patent: 5166530 (1992-11-01), McCleary
patent: 5194740 (1993-03-01), Kogelschatz et al.

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