Method of making a phase mask and mask for use in near-ultra-vio

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

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G03F 900

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059725427

ABSTRACT:
A method of making a phase mask for imposing on light transmitted therethrough an interference pattern. The method comprises various steps including the step of depositing a solidifiable material on a substrate with a first surface relief pattern. The solidifiable material is selected so that the phase mask is at least half as transmissive as it is absorptive of light characterized by a spectral line having a wavelength between 275 and 390 nm. The material is solidified and removed from the substrate so as to yield the phase mask with a second surface relief pattern complementary to the first surface relief pattern.

REFERENCES:
patent: 4329385 (1982-05-01), Banks et al.
patent: 4474427 (1984-10-01), Hill et al.
patent: 5066133 (1991-11-01), Brienza
patent: 5104209 (1992-04-01), Hill et al.
patent: 5287427 (1994-02-01), Atkins et al.
patent: 5327515 (1994-07-01), Andeson et al.
patent: 5351321 (1994-09-01), Snitzer et al.
patent: 5367588 (1994-11-01), Hill et al.
patent: 5604829 (1997-02-01), Bruesselbach
patent: 5620495 (1997-04-01), Aspell et al.
patent: 5652818 (1997-07-01), Byron
Dianov, Starodubov, Vasiliev, Frolov and Medvedkov, "Near-UV Photosensitivity of Germanosilicate Glass: Application for Fiber Grating Fabrication," 9th Annual Meeting of IEEE Lasers and Electro-Optics Society, 1996 Annual Meeting (Nov. 1996).
Dianov, Kurkov, Medvedkov and Vasil'ev, "A New Sensitive Method for Measuring Induced Refractive Index Change in Optical Fiber Core", Photosensitivity and Quadratic Nonlinearity of Glass Waveguides (Fundamentals and Applications), Optical Society of America, 1995 Technical Digest Series, vol. 22 (Sep. 1995).
Dianov and Starodubov, "Microscopic Mechanisms of Photosensitivity In Germanium-Doped Silica Glass", SPIE Proc. 2777, pp. 60-70 (1995).
Meltz, Morey and Glenn, "Formation Of Bragg Gratings in Optical Fibers By A Transverse Holographic Method", Optics Letters, vol. 14, No. 15, pp. 823-825 (Aug. 1, 1989).
Atkins and Espindola, "Photosensitivity and Grating writing in Hydrogen Loaded Germanosilicate Core Optical Fibers at 325 and 351 nm", Appl/Phys. Lett. 70 (9), pp. 1068-1069 (Mar. 3, 1997).
Kashyap, "Photosensitive Optical Fibers: Devices and Applications", Optical Fiber Technology 1, pp. 17-34 (1994).

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