Phase-shifting mask and a manufacturing method thereof

Details Phase-shifting mask and a manufacturing method thereof Phase-shifting mask and a manufacturing method thereof

1997-11-10

1999-10-26

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430325, G03F 900

Patent

active

059725400

ABSTRACT:
A phase-shifting mask has a phase shifter formed by thermal deformation of an organic photoresist followed by a CMP (Chemical Mechanical Polishing) process to prevent occurrence of pattern errors at an 180.degree./0.degree. phase boundary. A related method is also disclosed, including the steps of: providing a substrate; forming a conductive transparent layer on the substrate; forming light shielding layers at predetermined intervals on the conductive transparent layer; and forming phase shifters having planar top and rounded sides in phase-shifting regions between the light shielding layers.

REFERENCES:
patent: 5254418 (1993-10-01), Kamon et al.
patent: 5268244 (1993-12-01), Yoo
patent: 5281500 (1994-01-01), Cathey et al.
patent: 5288568 (1994-02-01), Cathey et al.
patent: 5300377 (1994-04-01), Keum
patent: 5322748 (1994-06-01), Watakabe et al.
patent: 5532089 (1996-07-01), Adair et al.

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