Fishing – trapping – and vermin destroying
Patent
1994-01-18
1995-07-04
Quach, T. N.
Fishing, trapping, and vermin destroying
437188, 437199, 437247, H01L 2128, H01L 21324
Patent
active
054299853
ABSTRACT:
A method is provided to produce a low-resistivity ohmic contact having high optical reflectivity on one side of a semiconductor device. The contact is formed by coating the semiconductor substrate with a thin metal film on the back reflecting side and then optically processing the wafer by illuminating it with electromagnetic radiation of a predetermined wavelength and energy level through the front side of the wafer for a predetermined period of time. This method produces a thin epitaxial alloy layer between the semiconductor substrate and the metal layer when a crystalline substrate is used. The alloy layer provides both a low-resistivity ohmic contact and high optical reflectance.
REFERENCES:
patent: 4151008 (1979-04-01), Kirkpatrick
patent: 4321104 (1982-03-01), Hasegawa et al.
patent: 4331485 (1982-05-01), Gat
patent: 4335362 (1982-06-01), Salathe et al.
patent: 4350537 (1982-09-01), Young et al.
patent: 4359486 (1982-11-01), Patalong et al.
patent: 4525221 (1985-06-01), Wu
patent: 4566177 (1986-01-01), Van de Ven et al.
patent: 5166095 (1992-11-01), Hwang
patent: 5219790 (1993-06-01), Miyatake
patent: 5223453 (1993-06-01), Sopori
patent: 5304509 (1994-04-01), Sopori
patent: 5358574 (1994-10-01), Sopori
Midwest Research Institute
O'Connor Edna M.
Quach T. N.
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