Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1993-05-27
1995-07-04
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430193, 528153, 528155, G03F 7023
Patent
active
054299047
ABSTRACT:
A positive resist composition comprising a quinonediazide compound and an alkali-soluble resin containing resin (A) obtainable through a condensation reaction of at least one compound represented by the general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one polyphenol compound represented by the general formula ( II ): ##STR2## wherein R.sub.4 ' to R.sub.6 ' each represent a hydrogen atom or an alkyl or alkoxy group and n represents 1 or 2, with an aldehyde compound. This positive resist composition is excellent in properties such as profile, resolution, heat resistance, etc. and nearly completely free from scum
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Patent Abstracts of Japan, vol. 015, No. 469 (P-1281) Nov. 27, 1991 and JP-A-03 200 254 (Nippon Zeon Co Ltd) Sep. 2, 1991.
Hashimoto Kazuhiko
Moriuma Hiroshi
Nagase Kyoko
Osaki Haruyoshi
Bowers Jr. Charles L.
Chu John S.
Sumitomo Chemical Company Ltd.
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