Photomask and pattern forming method employing the same

Details Photomask and pattern forming method employing the same Photomask and pattern forming method employing the same

1993-12-07

1995-07-04

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430312, 430322, G03F 900

Patent

active

054298962

ABSTRACT:
A semitransparent phase shifting mask has, in the periphery of a pattern element area, a light shielding portion which is formed by a semitransparent phase shifting portion and a transparent portion with the optimal size combination. A pattern is formed employing the semitransparent phase shifting mask.

REFERENCES:
patent: 4360586 (1982-11-01), Flanders et al.
patent: 4890309 (1989-12-01), Smith et al.
patent: 5328807 (1994-07-01), Tanaka et al.
Journal of Vacuum Science Technology, 16(6), Nov./Dec. 1979, "Spatial period division--A new technique for exposing submicrometer-line width periodic and quasiperiodic patterns", Flanders et al, pp. 1949-1952.

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