Electron beam exposure method and system for exposing a pattern

Details Electron beam exposure method and system for exposing a pattern Electron beam exposure method and system for exposing a pattern

1993-07-29

1994-11-29

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

25049223, 250398, H01J 37302

Patent

active

053692829

ABSTRACT:
An electron beam exposure process includes a step of producing a plurality of electron beam elements from a single electron beam by shaping and radiating the plurality of electron beam elements on a substrate. The exposure is achieved in a plurality of times with respective electron beam patterns by means of different sets of electron beam elements, wherein the electron beam elements of different sets are produced simultaneously and deflected simultaneously so as to scan the substrate consecutively. The electron beam elements in one set are offset from corresponding electron beam elements of the other set by a pitch of M/N wherein N represents the number of the electron beam sets and M is an integer smaller than N.

REFERENCES:
patent: 4153843 (1979-05-01), Pease
patent: 4724328 (1988-02-01), Lischke
patent: 4879605 (1989-11-01), Warkentin et al.
patent: 5214291 (1993-05-01), Hirai et al.

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