Dual mode spectrometer test station

Details Dual mode spectrometer test station Dual mode spectrometer test station

1983-03-03

1985-03-19

Smith, Alfred E.

Radiant energy

Invisible radiant energy responsive electric signalling

Infrared responsive

356244, G01J 100

Patent

active

045061580

ABSTRACT:
A new spectrometer station for semiconductor wafers is provided that permits operation in both the reflective and absorption modes either simultaneously or sequentially while the wafer is in a horizontal position. The wafer is positioned in the station on a movable platform. Positioned under the platform is an infrared detector. An optical system over the platform focuses an interferometer beam at that portion of the wafer positioned right over the detector. It also directs light from the beam reflected off the top surface of the wafer at a second infrared detector. An orientor rotates the wafer on the platform so that movement of the wafer by the orientor and movement of the platform allows any part of the wafer to be examined as a test point by the spectrometer.

REFERENCES:
patent: 3994586 (1976-11-01), Sharkins
patent: 3999866 (1976-12-01), Mathisen
Briska et al., "Apparatus and Method for Determining the Carbon Content in Silicon Wafers", IBM Technical Disclosure Bulletin, vol. 23, No. 1, Jun.-1980, p. 225.
Guggenheim et al., "Wafer Transport for IR Analysis", IBM Technical Disclosure Bulletin, vol. 22, No. 2, Jul.-1979, p. 586.

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