Method and apparatus for generating exposure masks

Photocopying – Projection printing and copying cameras – Step and repeat

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355 55, G03B 2742, G03B 2752

Patent

active

045055807

ABSTRACT:
A method and apparatus for generating exposure masks is disclosed which markedly reduces the number of required process steps. A plurality of recording originals are successively reproduced in reduced form on a photosensitive recording substrate. These reduced size images are adjusted and placed in registry with respect to one another by means of a computer. In order to achieve this desired result, the computer calculates from the prescribed desired coordinate values and the measured actual coordinate values of index marks included on the recording original, an angle .DELTA..phi. through which the recording original must be rotated to achieve the desired orientation. The computer then acts to determine the corrected actual coordinate values of the diagonal intersection point and from these the coordinate values at which the recording substrate is to be positioned to achieve the desired in registry reproduction of the reduced size image of the recording original. This process is repeated for a number of recording originals, reduced size images of which are successively reproduced on the recording substrate, which is in each case appropriately positioned by means of the computer. The recording substrate is then developed, and the desired exposure mask is produced by photolithographic techniques.

REFERENCES:
patent: 3940211 (1976-02-01), Johannsmeir
patent: 4110762 (1978-08-01), Tigreat
patent: 4225225 (1980-09-01), Hyatt
patent: 4422754 (1983-12-01), Isowata et al.
Master Artwork Generator Sys. by H. H. Bloem et al. Article in IBM Technical Disclosure Bulletin, vol. 21, No. 9, Feb. 1979.

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