Ion injection device

Details Ion injection device Ion injection device

1992-05-28

1995-01-17

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

25044211, 361234, 279128, H02N 1300

Patent

active

053828038

ABSTRACT:
An ion injection device comprises a rotatable holding table for holding a semiconductor wafer, a rotary driving mechanism for rotating the holding table, and a detection device for detecting the position of the wafer. The holding table has a holding portion for electrostatically holding the wafer, and an electrode unit located below the holding portion substantially in parallel with an upper surface of the same. The holding portion is made of a dielectric member, and the electrode unit includes a plurality of electrodes separated from one another. The ion injection device further comprises a power source for applying voltage between the electrodes, a control device for controlling the application and interruption of voltage between the electrodes, and an ion injection unit for injecting ions into the wafer.

REFERENCES:
patent: 4873447 (1989-10-01), Imahashi
patent: 5179498 (1993-01-01), Hongoh et al.

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