Solid state chain extension polymerization between Lewis acid ol

Details Solid state chain extension polymerization between Lewis acid ol Solid state chain extension polymerization between Lewis acid ol

1991-10-31

1995-01-17

Carrillo, Ana L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

522146, 522168, 525420, 525434, 528335, 528353, C08L 7700, C08L 7908

Patent

active

053826370

ABSTRACT:
A solid state chain extension method provides for the formation of a solid state film comprised of a high molecular weight polymer by chain extending a deblocked Lewis base with Lewis acid oligomers while the reactants are in a solid state form. In one embodiment, a negative resist is prepared by selectively exposing regions of the solid state film. The Lewis base is deblocked at the exposed regions by a suitable deblocking means. The Lewis acid oligomers and the deblocked Lewis base chain extend at the exposed regions. Development of the film removes the non-polymerized reactants. Optionally, the Lewis acid oligomers, when radiation-cross-linking, are cross-linked with one another prior to deblocking the Lewis base to form a negative resist. The cross-linked oligomers polymerize with the subsequently deblocked base to provide a high molecular weight polymer film. In an alternative embodiment, a positive resist is used by degrading and removing phot-sensitive Lewis acid oligomers using selective exposure lithography techniques and, subsequently, deblocking the Lewis base and chain extending the remaining oligomers with the deblocked Lewis base at the unexposed regions.

REFERENCES:
patent: 4481339 (1984-11-01), Bolon
patent: 4719267 (1988-01-01), Rizk et al.
patent: 4728697 (1988-03-01), Bolon et al.
patent: 4810613 (1989-03-01), Osuch et al.
patent: 4832808 (1989-05-01), Buchwalter
patent: 4837124 (1989-06-01), Wu et al.

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