Apparatus for measuring relative movement using a diffraction gr

Details Apparatus for measuring relative movement using a diffraction gr Apparatus for measuring relative movement using a diffraction gr

1992-10-02

1995-07-25

Turner, Samuel A.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356351, 250237G, G01B 902

Patent

active

054367247

ABSTRACT:
An apparatus for measuring relative movement by the use of a diffraction grating includes a light beam generating portion generating a light beam including light wave components having planes of polarization orthogonal to each other, an interference optical system for directing the light beam from the light beam generating portion to the diffraction grating, the light beam directed by the interference optical system being diffracted by the diffraction grating to thereby at least create two diffracted light beams of different orders having planes of polarization orthogonal to each other, the interference optical system being disposed so as to superpose the two diffracted lights one upon the other or upon other light and cause them to interfere with each other, and a detecting system for detecting the interfering light beams from the interference optical system. The relative movement of the diffraction grating and the interference optical system is measured by the detection by the detecting system. The interference optical system has in at least a portion of the optical path from the diffraction grating to the detecting system a polarization maintaining optical fiber for propagating the two diffracted light beams therethrough.

REFERENCES:
patent: 4652129 (1987-03-01), Martinelli
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patent: 5067813 (1991-11-01), Ishizuka et al.
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patent: 5182610 (1993-01-01), Shibata
IBM Technical Disclosure Bulletin, vol. 32, No. 10B, Mar. 1990, "Interferometric Method of Checking the Overlay Accuracy in Photolithographic Exposure Processes".

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