Photo-assisted CVD

Coating processes – Electrical product produced – Welding electrode

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2041571R, 427 86, C23C 1300

Patent

active

044354452

ABSTRACT:
A process and apparatus for depositing a film from a gas involves introducing the gas to a deposition environment containing a substrate, heating the substrate, and irradiating the gas with radiation having a preselected energy spectrum, such that a film is deposited onto the substrate. In a preferred embodiment, the energy spectrum of the radiation is below or approximately equal to that required to photochemically decompose the gas. In another embodiment, the gas is irradiated through a transparent member exposed at a first surface thereof to the deposition environment, and a flow of substantially inert gaseous material is passed along the first surface to minimize deposition thereon.

REFERENCES:
patent: 3200018 (1965-08-01), Grossman
patent: 3271180 (1966-09-01), White
patent: 3490961 (1970-01-01), Frieser et al.
patent: 3661637 (1972-05-01), Sirtl
patent: 4100418 (1978-07-01), Brown
patent: 4340617 (1982-07-01), Deutsch et al.
patent: 4348428 (1982-09-01), Rockley et al.
White et al., "IBM TDB", vol. 5, No. 3, Aug. 1962, pp. 3,4.
Perkins et al., "The 147-nm Photolysis of Monosiline", Journal of the American Chemical Society, 101:5, 1979.
Krene et al., "Photolysis of Diborane at 1849A", Journal of Chemical Physics, vol. 37, No. 2, 1962.

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