Method for forming a protecting film on side walls of a semicond

Details Method for forming a protecting film on side walls of a semicond Method for forming a protecting film on side walls of a semicond

1982-06-18

1984-03-06

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

204192P, 427 431, B05D 306, C23C 1700

Patent

active

044354436

ABSTRACT:
A method for forming a protecting film on the side walls of a semiconductor device, e.g. a semiconductor laser, having an exposed PN junction at the side walls thereof is carried out by the following steps. The semiconductor device is placed on a substrate target made of a protecting film material. Energetic particles are impinged against the substrate target. Particles of the material are emitted from the substrate target and deposited on only the side walls to form the protecting film.

REFERENCES:
patent: 3519788 (1970-07-01), Hatzakis
patent: 3846294 (1974-11-01), Vossen
patent: 4172907 (1979-10-01), Mones et al.
Ladany et al., "App. Phys. Lett.," vol. 30, No. 2, pp. 87-88, 1977.
Shima et al., "App. Phys. Lett.," vol. 31, No. 9, pp. 625-627, 1977.
Barnes et al., "J. Appl. Phys.," vol. 49, No. 5, pp. 2981-2982.

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