Fabrication method of fine structures

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Crucibleless process having movement of discrete droplets or...

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117931, 117935, 117921, 117938, C30B 2300

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active

053817532

ABSTRACT:
A fabrication method provides fine structures which have few carrier trap centers and light absorption levels and find applications in quantum wires and quantum boxes having arbitrary configurations at least within a two-dimensional plane. The fabrication method comprises the steps of having a sharp tip held in close proximity to the surface of a substrate 1 and having a metal constituting the tip evaporated from the top. Alternatively, a metal contained in ambient vapor or a solution decomposed by a tunnel current or the like is provided. The metal is deposited locally on the substrate surface. A finely structured crystal is grown on the locally deposited region by a vapor phase-liquid phase-solid phase reaction.

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patent: 3632405 (1972-01-01), Knippenberg et al.
patent: 3635753 (1972-01-01), Arthur et al.
patent: 4058418 (1977-11-01), Lindmayer
patent: 4099986 (1978-07-01), Diepers
Wagner et al., "The Vapor-Liquid Solid Mechanism of Crystal Growth and Its Application to Silicon", Transactions of the Metallurgical Society of AIME vol. 233 Jun. 1965 pp. 1053-1064.
R. S. Wagner & W. C. Ellis, "Vapor-Liquid-Solid Mechanism of Single Crystal Growth", Applied Physics Letters, vol. 4, No. 5, pp. 89-90 (Mar. 1964).

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