Fishing – trapping – and vermin destroying
Patent
1993-08-06
1995-07-25
Chaudhuri, Olik
Fishing, trapping, and vermin destroying
437184, 437192, 437200, H01L 21465
Patent
active
054362059
ABSTRACT:
In a process of patterning a conductive film on a semiconductor layer using a mask, thereby to form an electrode, first, anisotropic etching is applied to a conductive film which is not covered by a mask under ambient atmosphere at a high pressure in an almost perpendicular direction, and conductive film materials sublimated by the etching are redeposited on a side wall of a conductive film under the mask. Lastly, the conductive film on the semiconductor layer and redeposited metal are etched isotropically by etchant having low energy under ambient atmosphere where the pressure is reduced, thus having the semiconductor layer exposed from the area which is not covered by the mask.
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Low-Temperature Dry Etching; Shin-ichi Tachi and Kazunori Tsujimoto; IEEE Tokyo Section, Denshi, Tokyo No. 30 (1991) pp. 25-29.
Chaudhuri Olik
Fujitsu Limited
Tsai H. Jey
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