Organic compounds -- part of the class 532-570 series – Organic compounds – Heterocyclic carbon compounds containing a hetero ring...
Patent
1994-04-28
1995-08-01
Niebling, John
Organic compounds -- part of the class 532-570 series
Organic compounds
Heterocyclic carbon compounds containing a hetero ring...
546151, 546180, 546181, 546341, 204279, 204280, C07D21700
Patent
active
054381401
DESCRIPTION:
BRIEF SUMMARY
The present invention concerns an improved process for producing nickelized shaped articles by electrodeposition of nickel from aqueous acidic baths containing as essential constituents one or more nickel salts, one or more inorganic acids and one or more brighteners.
Some of the brighteners used here are new substances. Accordingly, the invention also relates to these new substances.
It is known that acidic nickel electrolytes must contain small amounts of organic substances if the electronickelization is to produce a bright, ductile and surface-planar deposition of the metal. Such brighteners, which in general are divided into primary and secondary brighteners, are customarily used in the form of combinations comprising a plurality of these agents in order to enhance the effect.
Praktische Galvanotechnik, Eugen G. Lenze Verlag, Saulgau, 4th edition 1984, pages 268 to 271 (1) describes customary brighteners for nickel electrolytes. Although the compounds are classified as primary or secondary brighteners or planarizers, it is admitted at the same time that clear-cut classification is not always possible. The brightening compounds mentioned are: further hetero atoms such as sulfur or selenium
DE-B-11 91 652 (2) describes single- or multi-ring heterocyclic nitrogen bases of the aromatic type in quaternized form such as pyridinium salts, eg. 2-pyridin-ium-1-sulfatoethane, as planarizers, ie. brighteners, for acidic nickel-plating baths. These agents are used together with customary basic brighteners such as benz-ene-m-disulfonic acid, diaryldisulfimides or sulfonamides.
DD 81 548 (3) and DD 108 777 (4) describe pyridiniumacetic acid derivatives of the general formula II ##STR2## where R.sub.9 is hydrogen, alkyl or alkenyl, as brighteners for the electrodeposition of nickel layers.
FR-A-2 292 057 (5) describes cyclic ammonium compounds of the general formula III ##STR3## where R.sup.10 is hydrogen, methyl, ethyl, propyl, isopropyl, carboxyl or aliphatic carboxylate, R.sup.11 is hydrogen, methyl, carboxyl or aliphatic carboxylate, R.sup.12 is the radical of an aliphatic alcohol, q is 0, 1 or 2, and Y.sup.63 is hydroxide or halide, as brighteners in electroplating baths for the deposition of nickel.
In industry, it is customary to use alkenylsulfonic acid brighteners such as sodium vinylsulfonate or sodium allylsulfonate together with other brighteners such as propargyl alcohol, 2-butyne-1,4-diol, propynesulfonic acid or 3-pyridinium propylsulfonate.
However, the prior art agents generally need to be used in a relatively high concentration in the nickel electrolyte baths used.
The invention has for its object an improved process for producing nickelized shaped articles using brighteners which, while being better than or at least as good as for example 2-pyridinium-1-sulfatoethane, 3pyridinium propylsulfonate of compounds of the general formulae II and III i their brightening, can be used in a lower concentration.
We have found that this object is achieved by a process for producing nickelized shaped articles by electrodeposition of nickel from aqueous acidic baths containing as essential constituents one or more nickel salts, one or more inorganic acids and one or more brighteners, which comprises using brighteners that are cyclic ammonium compounds of the general formula I ##STR4## where the nitrogen atom is part of a pyridine, quinoline or isoquinoline ring system which can additionally carry one or two C.sub.1 -C.sub.4 -alkyl substituents, --CO--O--R.sup.3, --O--CO--R.sup.3 or --O--R.sup.3, where -C.sub.12 -phenylalkyl or phenyl which can be substituted by one or two C.sub.1 -C.sub.4 -alkyl radicals, C.sub.1 -C.sub.4 -alkoxy radicals, halogen atoms, hydroxyl groups, phenyl radicals or C.sub.1 -C.sub.4 -alkoxycarbonyl groups, water solubility, must not be 1, 2 or 3 and under the same conditions R.sup.1 must not be hydrogen when m is 0.
Suitable C.sub.1 -C.sub.4 -alkyl radicals for R.sup.1 and R.sup.2 and also for possible substituents on the heterocyclic ring system and on the phenyl ring are n-propyl, isopro
REFERENCES:
patent: 4457934 (1984-07-01), Wong
Praktische Galvanotechnik, Eugen G. Lenze Verlag, Saulgau, 4th Edition (no month) 1984, pp. 268 to 271.
Burkhart Bernd
Glaser Klaus
Oftring Alfred
Schwendemann Volker
BASF - Aktiengesellschaft
Niebling John
Wong Edna
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