Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Two or more radiation-sensitive layers containing other than...
Patent
1994-12-20
1995-08-01
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Two or more radiation-sensitive layers containing other than...
430505, 430544, 430362, 430358, 430956, 430957, G03C 146
Patent
active
054379652
ABSTRACT:
A silver halide color photographic material comprising a support having thereon at least one yellow coupler-containing blue-sensitive silver halide emulsion layer (BL), at least one magenta coupler-containing green-sensitive silver halide emulsion layer (GL) and at least one cyan coupler-containing red-sensitive silver halide emulsion layer (RL); wherein the weight-averaged wavelength of the spectral sensitivity distribution of GL (.lambda..sub.G) of the photographic material is between 520 nm and 580 nm (520 nm.ltoreq..lambda..sub.G .ltoreq.580 nm), the weight-averaged wavelength of the spectral sensitivity distribution of RL (.lambda..sub.R) of the photographic material is between 590 nm and 650 nm (590 nm.ltoreq..lambda..sub.R .ltoreq.650 nm), and the weight-averaged wavelength of the spectral sensitivity distribution of BL (.lambda..sub.B) of the photographic material is between 430 nm and 480 nm (430 nm.ltoreq..lambda..sub.B .ltoreq.480 nm); wherein the photographic material satisfies at least one of the requirements (a), (b) and (c) as defined in claim 1; wherein the photographic material contains at least one compound represented by formula (P-2) or (P-3) as recited in claim 1; and wherein a maximum interlayer effect to the RL at the weight-averaged wavelength .lambda..sub.R is imparted from at least one of the layers selected from the group consisting of the BL and GL, and the difference between the weight-averaged wavelength in the color sensitivity distribution of GL (.lambda..sub.G) and the weight-averaged wavelength of the negative interlayer effect relative to RL .lambda..sub.-R is 5 nm or more .lambda..sub.G -.lambda..sub.-R .gtoreq.5 nm).
REFERENCES:
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patent: 4663271 (1987-05-01), Nozawa et al.
patent: 4705744 (1987-11-01), Sasaki et al.
patent: 4994358 (1991-02-01), Deguchi et al.
patent: 5053324 (1991-10-01), Sasaki et al.
patent: 5077182 (1991-12-01), Sasaki et al.
Kawagishi Toshio
Tomita Shunichi
Uchida Minoru
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
McPherson John A.
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