Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1994-03-03
1995-08-01
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430321, 430322, 355 53, 355 77, G03F 900
Patent
active
054379466
ABSTRACT:
An improved method for stitching together reticle patterns on a substrate is described. One or more reticles, whose reticle border patterns are to be blended together on the substrate, are provided on an X-Y movable stage in a scanning type exposure system. Each of the reticles has a border pattern which is identical to the border pattern of at least one of the other reticles so that, when the images of these reticles border patterns overlap on the substrate, the overlapping border patterns effectively form a single image on the substrate. To prevent the double exposure of the overlapping border patterns from overexposing the photoresist and to reduce any detrimental effects resulting from misalignment between the overlapping patterns, either a triangular end portion of the scanning source, a filter, or a movable blind is used to partially shade the overlapping border pattern as the UV source is scanned over the border pattern. The graded exposures of the photoresist by the overlapping border patterns combine to fully expose the overlapping border patterns on the substrate. This procedure is continued so as to provide repeated reticle patterns in two dimensions which blend together.
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Jere D. Buckley et al., "Step-and-scan lithography using reduction optics," J. Vac. Sci. Technol. B 7(6), Nov./Dec. 1989, pp. 1607-1612.
Ronald E. Sheets et al., "Scanning Projection Exposure Tools for Large Area Thin Film Displays," 1994 Display Manufacturing Technology Conference, Digest of Technical Papers, SID, First Edition, Jan. 1994, pp. 97-98.
David E. Kettering, "Applying Step-and-Repeat Technologies to Produce Liquid Crystal Display ICs," Reprinted from Microelectronic Manufacturing and Testing, Jun. 1987, pp. 1-3.
James P. Rominger, "Seamless Stitching for Large Area Integrated Circuit Manufacturing," SPIE vol. 922 Optical/Laser Microlithography (1988), pp. 188-193.
Nikon Precision Inc.
Ogonowsky Brian D.
Rosasco S.
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