Insulating supporting structure for high-voltage apparatus inclu

Details Insulating supporting structure for high-voltage apparatus inclu Insulating supporting structure for high-voltage apparatus inclu

1994-10-17

2000-03-21

Kincaid, Kristine

Electricity: conductors and insulators

Insulators

Special application

174209, 174137B, 174 521, H01B 1700

Patent

active

060405287

ABSTRACT:
An electrically insulating supporting structure for a high voltage electric apparatus having a high voltage charging part and a ground potential part, the structure being adapted to be disposed between the high voltage charging part apparatus and the ground potential part. The structure includes an organic insulating structure formed in a predetermined shape, and an inorganic insulating layer formed on a surface of the organic insulating structure and an intermediate layer consisting essentially of an organic and an inorganic powder.

REFERENCES:
patent: 2389386 (1945-11-01), Russell, Jr.
patent: 2431474 (1947-11-01), Gaudenzi et al.
patent: 3076053 (1963-01-01), Moussou
patent: 3118968 (1964-01-01), Moussou
patent: 3812284 (1974-05-01), Pohl
patent: 4476155 (1984-10-01), Niemi
patent: 4845318 (1989-07-01), Clabburn et al.
patent: 4956903 (1990-09-01), Thuries
patent: 4965407 (1990-10-01), Hamm
patent: 5212013 (1993-05-01), Gupta et al.
patent: 5246729 (1993-09-01), Gupta et al.
patent: 5286664 (1994-02-01), Horiuchi
patent: 5340500 (1994-08-01), Chao et al.
Ta'a Electric Wire & Cable Co., Ltd.. TK1/ZYECAT, No. 48, 1994, pp. 96-99. No Month.

Affiliated with

Also associated with

Rating

Insulating supporting structure for high-voltage apparatus inclu does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Insulating supporting structure for high-voltage apparatus inclu, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Insulating supporting structure for high-voltage apparatus inclu will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-732024