Photomask and method of fabricating the same

Details Photomask and method of fabricating the same Photomask and method of fabricating the same

1992-07-21

1994-11-29

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430269, 430311, G03F 900

Patent

active

053689631

ABSTRACT:
A photomask comprises light shielding areas with a light shielding layer formed on a mask substrate, and a light transmitting area defined on the mask substrate by the light shielding areas, the light transmitting area being divided in a first area with a 90.degree. phase shifter formed thereon for shifting phase of transmitted light by 90.degree., a second area with a 270.degree. phase shifter formed thereon for shifting phase of transmitted light by 270.degree., and a third area with neither the 90.degree. phase shifter nor the 270.degree. phase shifter formed thereon, the first and the second areas being arranged without being overlapped on each other and with the light shielding areas or the third area located therebetween.

REFERENCES:
patent: 5229255 (1993-07-01), White
Ohtsuka et al., "Conjugate Twin-Shifter for the New Phase Shift Method to High Resolution Lithography," Spie vol. 1463, Optical/Laser Microlithograph IV (1991), pp. 112-123.
Patent Abstracts of Japan, vol. 16, No. 605 (P-1365) Jun. 5, 1992 & JP-A-4 055854 (Matsushita Electric Ind Co) Feb. 24, 1992.

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