Improved carbon containing thin film formed by increasing bias v

Details Improved carbon containing thin film formed by increasing bias v Improved carbon containing thin film formed by increasing bias v

1990-12-12

1994-11-29

King, Roy V.

Stock material or miscellaneous articles

Self-sustaining carbon mass or layer with impregnant or...

427122, 427577, 427249, 423446, B32B 904

Patent

active

053689372

ABSTRACT:
The present invention discloses a carbon film on a substrate formed by increasing a bias voltage during a plasma CVD process, wherein the entire carbon film is amorphous and the hardness of the film increases away from the substrate in the direction of the thickness of the film.

REFERENCES:
patent: 4647494 (1987-03-01), Meyerson et al.
patent: 4770940 (1988-09-01), Ovshinsky et al.

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