Projection exposure method and apparatus

Details Projection exposure method and apparatus Projection exposure method and apparatus

1995-07-24

1998-01-20

Malley, Daniel P.

Photocopying

Projection printing and copying cameras

Step and repeat

355 62, 355 71, 430 5, G03B 2742

Patent

active

057106207

ABSTRACT:
An exposure apparatus comprises an illumination optical system for irradiating an illuminating light onto a mask having a plurality of patterns for which pattern forming conditions differ from one another, and a projection optical system for projecting images of said plurality of patterns onto a photosensitive substrate, a device for compensating imaging errors of pattern images to be projected onto said substrate, and a control system for controlling the operation of said compensating device in accordance with imaging errors of said plurality of pattern images so that said plurality of pattern images may be projected in specified imaging characteristics.

REFERENCES:
patent: 4558949 (1985-12-01), Uehara et al.
patent: 4650983 (1987-03-01), Suwa
patent: 4666273 (1987-05-01), Shimizu et al.
patent: 4770531 (1988-09-01), Tanaka et al.
patent: 4924257 (1990-05-01), Jain
patent: 4931830 (1990-06-01), Suwa et al.
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5184176 (1993-02-01), Unno et al.
patent: 5194893 (1993-03-01), Nishi
patent: 5251067 (1993-10-01), Kamon
patent: 5256881 (1993-10-01), Yamazaki et al.
patent: 5270771 (1993-12-01), Sato
patent: 5291239 (1994-03-01), Jackson
patent: 5337097 (1994-08-01), Suzuki et al.
patent: 5363172 (1994-11-01), Tokoda
patent: 5448332 (1995-09-01), Sakakibara et al.
patent: 5461237 (1995-10-01), Wakamoto et al.
patent: 5502311 (1996-03-01), Imai et al.
Naomasa Shiraishi et al., SPIE/Optical/Laser Microlithography V, "New Imaging Technique For 64M-DRAM" vol. 1674, Mar. 11-13, 1992, pp. 741-752.

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