Positive photoresist compositions with o-quinone diazide, novola

Details Positive photoresist compositions with o-quinone diazide, novola Positive photoresist compositions with o-quinone diazide, novola

1984-06-11

1985-10-29

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430166, 430191, 430192, 430323, 430326, 430330, 430331, G03C 160, G03C 176, G03F 726

Patent

active

045500690

ABSTRACT:
The invention provides a positive working photosensitive composition which comprises at least one novolak resin, at least one o-quinone diazide and a propylene glycol alkyl ether acetate.

REFERENCES:
patent: 3228768 (1966-01-01), Straw et al.
patent: 3666473 (1972-05-01), Colom et al.
patent: 3859099 (1975-01-01), Petropoulos et al.
patent: 3868254 (1975-02-01), Wemmers
patent: 3933517 (1976-01-01), Vivian
patent: 4308368 (1981-12-01), Kubo et al.
patent: 4351895 (1982-09-01), Walls
patent: 4355094 (1982-10-01), Pampalone et al.
patent: 4381340 (1983-04-01), Walls
patent: 4397937 (1983-08-01), Clecak et al.
patent: 4409317 (1983-10-01), Shiraishi
patent: 4411983 (1983-10-01), Washizawa et al.
patent: 4416976 (1983-11-01), Schell
patent: 4439516 (1984-03-01), Cernigliaro et al.
patent: 4460674 (1984-07-01), Uehara et al.
patent: 4482661 (1984-11-01), Liu
Physical Org. Chem.--vol. 86, 1977--Chemical Abstracts-Nos. 86: 54765x, 89: 107342c, 94: 83268h & 44370d.

Affiliated with

Also associated with

Rating

Positive photoresist compositions with o-quinone diazide, novola does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive photoresist compositions with o-quinone diazide, novola, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive photoresist compositions with o-quinone diazide, novola will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-728353