Photosensitive polymeric material and electrophotometric materia

Details Photosensitive polymeric material and electrophotometric materia Photosensitive polymeric material and electrophotometric materia

1975-08-06

1977-07-26

Wong, Jr., Harry

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

96 15, 260 304N, 260 328N, 260 336UA, 260 338UA, 526259, C08F12606

Patent

active

040384683

ABSTRACT:
A photosensitive polymeric material having photoelectric properties based on poly-N-vinylanines, which actually comprise poly-N-vinyldiphenylamine, its derivatives, and also copolymers of N-vinyldiphenylamine with N-vinylamines, poly-N-vinylphenothiazine and poly-N-vinylphenoxazine. The polymers are applied onto electroconductive substrate to give an electrophotographic material. Said polymers are prepared by a method consisting in the interaction between secondary aromatic and heterocyclic amines or their mixtures with simple vinyl ethers in the presence of strong acids or with vinylacetate in the presence of salts of mercury (II) or lead (IV), strong acid and water.

REFERENCES:
patent: 3217044 (1965-11-01), Klug
patent: 3738961 (1973-06-01), Tomalia et al.

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