Mask having a pattern for detecting illuminance nonuniformity

Details Mask having a pattern for detecting illuminance nonuniformity Mask having a pattern for detecting illuminance nonuniformity

1996-05-14

1998-01-20

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 30, 430 22, G03F 900

Patent

active

057099707

ABSTRACT:
There is provided a mask used in a scan-exposing method of scanning a photosensitive substrate and a mask having a pattern formed therein in relation to a slit-shaped illuminated region, so that the photosensitive substrate is exposed to the pattern having an area larger than that of the slit-shaped illuminated region. The mask has an illuminance nonuniformity detecting pattern formed at an edge region of the mask along a scanning direction, beside a main pattern region of the mask.

REFERENCES:
patent: 5578401 (1996-11-01), Hwang

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