Plasma etching process for the manufacture of solar cells

Details Plasma etching process for the manufacture of solar cells Plasma etching process for the manufacture of solar cells

1978-04-24

1979-02-27

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

136 89R, 156643, C23C 1500, H01L 3106

Patent

active

041418115

ABSTRACT:
A process for manufacturing solar cells. Silicon wafers are assembled in a holding jig such as a diffusion boat in pairs with adjacent surfaces of each of the pairs in contact. The thus assembled wafers are subjected to a chemical vapor deposition diffusion step during which a phosphorous pentoxide glass layer is formed predominantly on the exposed surfaces and side edges of the wafers along with a PN junction thereunder. A small amount of the phosphorous pentoxide glass is also formed on the surfaces which are in contact with each other particularly at the outer edges thereof. The wafers are then reassembled in such a manner that the surfaces having the phosphorous pentoxide layer thereon are placed in contact with each other and again the wafers are placed in a holding jig. The thus assembled wafers are then placed in a plasma etching reactor for removal of the phosphorous pentoxide glass layer and the underlying PN junction from the side edges and the surfaces opposite the surfaces exposed during the previous diffusion step.

REFERENCES:
patent: 3361594 (1968-01-01), Iles et al.
patent: 4062102 (1977-12-01), Lawrence et al.

Affiliated with

Also associated with

Rating

Plasma etching process for the manufacture of solar cells does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma etching process for the manufacture of solar cells, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma etching process for the manufacture of solar cells will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-721646