Method of exposing a light sensitive material

Details Method of exposing a light sensitive material Method of exposing a light sensitive material

1995-06-07

1996-07-23

Ben, Loha

Optical: systems and elements

Optical modulator

Light wave temporal modulation

359281, 359254, 359245, 359295, G02F 111

Patent

active

055395686

ABSTRACT:
A phase shift illuminator (700) is comprised of a light source (704) and a phase modulator (716), typically a flexure beam micromirror array, which transversely modulates the incident light beam. When a flexure beam micromirror array is used as the phase modulator (716) a polarizing beam splitter (712) and a quarter-wave plate (714) are used to separate the incident and reflected light beams. The phase modulated light beam (720) from the optical illuminator may be used in optical lithography by passing the light beam through a lithography mask (724), typically after the light beam is phase modulated, and focusing the light beam onto a target wafer (726).

REFERENCES:
patent: 4054367 (1977-10-01), Eschler et al.
patent: 4450458 (1984-05-01), Aregi et al.
patent: 4954789 (1990-09-01), Sampsell
patent: 5105380 (1992-04-01), Owechko
Chen et al., "Submicrometer Lithography Using Lensless High-Efficiency Holographic Systems," Optics Letters, vol. 15, No. 15, 1990 Optical Society of America, pp. 369-371.
Clube, et al., "Holographic Mask Aligner," Optical Engineering, vol. 32, No. 10, Oct. 1993, pp. 2403-2409.
Levenson, "Wavefront Engineering for Photolithography," Physics Today, Jul. 1993, pp. 28-36.

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