Method for the deposition of diamond on a substrate

Details Method for the deposition of diamond on a substrate Method for the deposition of diamond on a substrate

1993-06-09

1994-11-29

Kunemund, Robert

Coating processes

Direct application of electrical, magnetic, wave, or...

Chemical vapor deposition

423446, 20415747, 427596, C30B 2904

Patent

active

053686810

ABSTRACT:
A method is disclosed for the deposition of crystalline diamond on a substrate such as a silicon wafer. A polymer (for example poly(methylmethacrylate)) is provided as a target for laser ablation using for example an ArF excimer laser or an Nd-Yag laser. The laser ablation is performed in the presence of a reactive gas such as oxygen or hydrogen. The substrate is heated to a temperature of between 450 and 700 degrees celsius.

REFERENCES:
patent: 4961958 (1990-10-01), Desphandey et al.
patent: 5055318 (1991-10-01), Deutchman et al.
patent: 5236545 (1993-08-01), Pryer
patent: 5242711 (1993-09-01), DeNatale et al.

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