Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1993-07-30
1995-03-14
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430176, 430281, 430282, 430283, 430285, 430286, 430287, 430288, G03F 7021
Patent
active
053976754
ABSTRACT:
The present invention provides a photosensitive resin composition for lithographic printing, which is developable with an alkali developer and exhibits excellent resolusion and excellent print durability. The photosensitive resin composition comprises (a) an alkali-swellable or alkali-soluble binder resin and (b) an oil-soluble diazo resin, wherein the binder resin has an acid value of 5 to 150 and has in molecules a group represented by ##STR1## wherein R.sup.1 represents a phenyl group which may have a substitution, R.sup.2 and R.sup.3, the same or different, represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R.sup.4 represents an alkylene group of which a backbone may be interrupted with an oxygen atom, a cycloalkylene group or a combination thereof, and may have thereon an alkyl group, a hydroxyl group, an oxo (.dbd.O) group or a combination thereof, and a and b independently shows 0 or 1.
REFERENCES:
patent: 4916046 (1990-04-01), Doessel
patent: 5229244 (1993-07-01), Hertler et al.
Arimatsu Seuji
Hase Takakazu
Ichinose Yoshifumi
Konishi Katsuji
Bowers Jr. Charles L.
Nippon Paint Co. Ltd.
Young Christopher G.
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