Method of forming diamond or diamond containing carbon film

Details Method of forming diamond or diamond containing carbon film Method of forming diamond or diamond containing carbon film

1993-07-02

1995-03-14

Lewis, Michael

Chemistry of inorganic compounds

Carbon or compound thereof

Elemental carbon

427249, 4272551, C30B 2904, C01B 3104

Patent

active

053975588

ABSTRACT:
A CVD method for forming a diamond or diamond containing carbon film comprises the step of inputting a reactive gas, supplying energy to the reactive gas, and depositing the carbon film on a substrate. The reactive gas includes a carbon compound material which has a diamond structure in its molecular structure. The representative material is adamantane. Oxygen or hydroxyl group is also added in order to improve the crystallinity of the deposited carbon film.

REFERENCES:
patent: 4816286 (1989-03-01), Hirose
patent: 4915977 (1990-04-01), Okamoto et al.
patent: 5015528 (1991-05-01), Dinneo
Translation of JP 62-103367 May 13, 1987.

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