Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...
Patent
1995-12-13
1997-04-29
Chapman, Mark
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Polymers from only ethylenic monomers or processes of...
526328, 4302701, C08F22012
Patent
active
056250207
ABSTRACT:
The present invention relates to an improved chemically amplified photoresist composition comprising (i) a photosensitive acid generator and (ii) a polymer comprising the reaction product of hydroxystyrene with acrylate, methacrylate or a mixture of acrylate and methacrylate.
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Breyta Gregory
Ito Hiroshi
Knors Christopher J.
Sooriyakumaran Ratnam
Chapman Mark
International Business Machines - Corporation
Martin Robert B.
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