Semiconductor exposure apparatus

Details Semiconductor exposure apparatus Semiconductor exposure apparatus

1998-05-18

1999-09-28

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

378 34, G21K 500

Patent

active

059593040

ABSTRACT:
An exposure apparatus for transferring a pattern, formed on a membrane of a mask, to an exposure region of a wafer disposed opposed to the mask with a small spacing kept therebetween. The apparatus includes an exposure system for transferring, by exposure, the pattern of the mask to different exposure regions of the wafer sequentially, a measuring system for producing deformation information related to at least one portion of the mask membrane, and an attitude controlling system for controlling attitude of at least one of the mask and the wafer, on the basis of the deformation information produced by the measuring system.

REFERENCES:
patent: 4385434 (1983-05-01), Zehnpfennig et al.
patent: 4475223 (1984-10-01), Taniguchi et al.
patent: 4648106 (1987-03-01), Novak
patent: 5112133 (1992-05-01), Kurosawa et al.
patent: 5123036 (1992-06-01), Uno et al.
patent: 5125014 (1992-06-01), Watanabe et al.
patent: 5134640 (1992-07-01), Hirokawa et al.
patent: 5172402 (1992-12-01), Mizusawa et al.
patent: 5285488 (1994-02-01), Watanabe et al.
patent: 5317615 (1994-05-01), Ebinuma et al.
patent: 5333167 (1994-07-01), Iizuka et al.
patent: 5347561 (1994-09-01), Ebinuma
patent: 5377251 (1994-12-01), Mizusawa et al.
patent: 5398271 (1995-03-01), Nishida et al.
patent: 5600698 (1997-02-01), Terashima et al.
patent: 5604779 (1997-02-01), Amemiya et al.

Affiliated with

Also associated with

Rating

Semiconductor exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-706241