Simple electromechanical tilt and focus device

Details Simple electromechanical tilt and focus device Simple electromechanical tilt and focus device

1982-07-06

1985-03-12

Rosenberger, R. A.

Optics: measuring and testing

Angle measuring or angular axial alignment

Sides of angle or axes being aligned transverse to optical...

250201, 355 53, G03B 2742

Patent

active

045041440

ABSTRACT:
An apparatus automatically for correcting tilt and focus errors of a wafer in a mask projection system for a plurality of subfields on the wafer which vary in position according to a known scheme. The tilt and focus of each subfield on the wafer is individually corrected by three axial actuators operating on the variable X and Y coordinates of the center of each subfield and its tilt and focus errors.

REFERENCES:
patent: Re30601 (1981-05-01), Horr et al.
patent: 4084903 (1978-04-01), Pircher
patent: 4344160 (1982-08-01), Gabriel et al.
patent: 4349254 (1982-09-01), Jyojiki et al.
patent: 4383757 (1983-05-01), Phillips
patent: 4405229 (1983-09-01), Mayer
patent: 4431304 (1984-02-01), Mayer

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