Patent
1984-05-07
1986-07-29
Edlow, Martin H.
357 16, 357 17, H01L 2712
Patent
active
046033408
ABSTRACT:
When two indirect only slightly different semiconductor materials having a suitable band gap, for example, AlAs and Al.sub.0.8 Ga.sub.0.2 As, are grown epitaxially one onto the other in layers of a few unit cell layers thick, the electronic band structures are folded so that the indirect minimum of the conduction band is displaced from the edge of the Brillouin zone to the center. The two indirect materials then constitute a superlattice with a band transition with a band gap of 2.2 eV.
REFERENCES:
patent: 3626257 (1971-12-01), Esaki et al.
patent: 4261771 (1981-04-01), Dingle et al.
Biren Steven R.
Edlow Martin H.
Mayer Robert T.
U.S. Philips Corporation
LandOfFree
Semiconductor device having superlattice structure does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Semiconductor device having superlattice structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device having superlattice structure will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-701902