Method for removal of moisture from gaseous HCl

Details Method for removal of moisture from gaseous HCl Method for removal of moisture from gaseous HCl

1997-11-05

1999-09-28

Nguyen, Ngoc-Yen

Chemistry of inorganic compounds

Halogen or compound thereof

Hydrogen halide

423210, 95117, C01B 707

Patent

active

059583568

ABSTRACT:
An adsorbent and method for removing water from gaseous HCl. MgCl.sub.2 supported on an activated carbon or silica gel substrate activated by heating to a temperature between 150.degree. C. (302.degree. F.) and 300.degree. C. (572.degree. F.) under vacuum will remove water at partial pressures of below 0.5 torr. Activation of the MgCl.sub.2 supported adsorbent can also be effected by heating the adsorbent between 270.degree. C. (518.degree. F.) and 400.degree. C. (752.degree. F.) under nitrogen.

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