Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent
1998-02-20
1999-09-28
Warden, Jill
Cleaning and liquid contact with solids
Processes
For metallic, siliceous, or calcareous basework, including...
134 1, 134 13, 134 18, 134 19, 134 26, 134 30, 134 31, 134 32, 134 33, 134 57R, 134 952, 134902, 15 77, 15 882, 15 883, 15102, B08B 300
Patent
active
059581450
ABSTRACT:
A method for washing both surfaces of a substrate, comprising (a) a first washing step for washing a front surface of a substrate, which is kept rotated, by bringing a scrubbing member into contact with said front surface of the substrate while supplying a washing liquid onto the front surface, (b) a second washing step for washing a back surface of the substrate, which is kept rotated, by bringing a scrubbing member into contact with said back surface of the substrate while supplying a washing liquid onto the back surface, (c) a heating step for drying under heat the wet surfaces of the substrate, (d) a recipe determining step for determining whether said heating step (c) is performed at a period between said first washing step (a) and second washing step (b) and at a period after the second washing step (b), whether the heating step (c) is performed only once after the second washing step (b), or whether the heating step (c) is not performed, and (e) a conducting step for performing or not performing the heating step (C) in accordance with the recipe determined in said recipe determining step (d).
REFERENCES:
patent: 5345639 (1994-09-01), Tanoue et al.
patent: 5351360 (1994-10-01), Suzuki et al.
patent: 5498294 (1996-03-01), Matsushita et al.
patent: 5518542 (1996-05-01), Matsukawa et al.
patent: 5636401 (1997-06-01), Yonemizu et al.
patent: 5651160 (1997-07-01), Yonemizu et al.
patent: 5858112 (1999-01-01), Yonemizu et al.
patent: 5861066 (1999-01-01), Moinpour et al.
patent: 5862560 (1999-01-01), Jensen et al.
Matsuyama Yuji
Yonemizu Akira
Carrillo S.
Tokyo Electron Limited
Warden Jill
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