Microlithographic reticle positioning system

Details Microlithographic reticle positioning system Microlithographic reticle positioning system

1985-11-29

1987-05-26

Watson, Robert C.

Geometrical instruments

Gauge

Work support adjustment

33 1M, 269 73, G01B 500

Patent

active

046674152

ABSTRACT:
In the reticle positioning system disclosed herein, a unitary structure is machined to form both a frame for holding a reticle and a compound linkage permitting lateral and rotational movement of the frame within its own plane under the control of three servo motors generating controllable displacements.

REFERENCES:
patent: 3069123 (1962-12-01), Angele et al.
patent: 4157818 (1979-06-01), Key
patent: 4492356 (1985-01-01), Taniguchi et al.
patent: 4559717 (1985-12-01), Scire et al.
patent: 4575942 (1986-03-01), Moriyama

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