Plating process for fine pitch die in wafer form

Metal fusion bonding – Process – Plural joints

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

228246, 228254, B23K 3102

Patent

active

059573708

ABSTRACT:
Apertures in a tape formed on a substrate allow straight plating of solder bumps to heights above 4 mils. The solder bumps are combined with a lower density material to form an hourglass-shaped structure which allows interconnections to bonding pads of electronic components with pitches less than 9 mils.

REFERENCES:
patent: 3401126 (1968-09-01), Miller et al.
patent: 3429040 (1969-02-01), Miller
patent: 4182781 (1980-01-01), Hooper et al.
patent: 4273859 (1981-06-01), Mones et al.
patent: 4412642 (1983-11-01), Fisher, Jr.
patent: 4664309 (1987-05-01), Allen et al.
patent: 4673772 (1987-06-01), Satoh et al.
patent: 4763829 (1988-08-01), Sherry
patent: 4783722 (1988-11-01), Osaki et al.
patent: 4878611 (1989-11-01), LoVasco et al.
patent: 4897918 (1990-02-01), Osaka et al.
patent: 5208186 (1993-05-01), Mathew
patent: 5244833 (1993-09-01), Gansauge et al.
patent: 5251806 (1993-10-01), Agarwala et al.
patent: 5304460 (1994-04-01), Fulton et al.
patent: 5361491 (1994-11-01), Oomachi et al.
patent: 5388327 (1995-02-01), Trabucco
patent: 5462638 (1995-10-01), Datta et al.
patent: 5564617 (1996-10-01), Degani et al.
Metal Finishing 63rd Guidebook and Directory Issue vol. 93 No. 1A, Jan., 1995 (3 pages).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Plating process for fine pitch die in wafer form does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plating process for fine pitch die in wafer form, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plating process for fine pitch die in wafer form will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-693818

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.