Method of making a thin-film strain gauge

Details Method of making a thin-film strain gauge Method of making a thin-film strain gauge

1985-02-08

1986-11-04

Niebling, John F.

Metal working

Method of mechanical manufacture

Electrical device making

29620, 156656, 20419215, 20419221, 427103, H01C 1712, G01L 122

Patent

active

046203656

ABSTRACT:
A thin-film strain gauge and a method for producing it are proposed; the strain gauge is advantageously capable of integration into a thin-film circuit. The strain gauge comprises an elastically deformable spring element in combination with at least one elongation-sensitive resistor. The resistor disposition (R1-R4), the low-impedance connections (L11-L42) between the various resistance regions and the associated connection tracks (L5-L8) are applied in a vacuum process, preferably by cathode sputtering. The low-impedance connections (L11-L42) and the connection tracks (L5-L8) are of material which, although different from the material making up the actual resistance region, still has approximately the same temperature coefficient of resistance, so as to preclude errors caused by temperature.

REFERENCES:
patent: 2837619 (1958-06-01), Stein
patent: 3242006 (1966-03-01), Gerstenberg
patent: 3757414 (1973-09-01), Keller
patent: 4329878 (1982-05-01), Utner et al.
J. J. Bessot et al., New Vacuum Deposition Techniques, Metal Finishing, Mar. 1980, pp. 21-26.

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