Exposure method

Details Exposure method Exposure method

1996-12-26

1999-04-27

Moses, R. L.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, G03B 2742, G03B 2754

Patent

active

058984801

ABSTRACT:
An exposure method wherein a mask on which a pattern is formed is illuminated with a slit-like illumination light beam, and the mask and a substrate are caused to scan the slit-like illumination light beam in a scanning direction in order to form an image of the pattern on the substrate, and wherein photo-electric signals obtained by a sensor which moves in the scanning direction, relative to the slit-like illumination light beam, and photo-electric signals obtained from the sensor which moves in a direction orthogonal to the scanning direction are integrated so as to obtain integrated values thereof, and an unevenness among the integrated values relating to a direction orthogonal to the scanning direction is calculated

REFERENCES:
patent: Re32795 (1988-12-01), Matsurra
patent: 5097291 (1992-03-01), Suzuki
patent: 5255051 (1993-10-01), Allen
patent: 5473410 (1995-12-01), Nishi
patent: 5483311 (1996-01-01), Sakakibara et al.

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