Integrated circuit which uses a recessed local conductor for pro

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum

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257776, A07C 2941

Patent

active

060312890

ABSTRACT:
An improved multilevel interconnect structure is provided. The interconnect structure includes several levels of conductors, wherein conductors on one level are staggered with respect to conductors on another level. In densely spaced interconnect areas, interposed conductors are drawn to dissimilar elevational levels to lessen the capacitive coupling between the interconnects. By staggering every other interconnect line in the densely patterned areas, the interconnects are capable of carrying a larger amount of current with minimal capacitive coupling therebetween.

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IBM Technical Disclosure Bulletin entitled, "Sub-Surface Local Interconnects," vol. 34, No. 12, May 1, 1992, pp. 283-285.

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