Method for extending the gas lifetime of excimer lasers

Details Method for extending the gas lifetime of excimer lasers Method for extending the gas lifetime of excimer lasers

1993-09-01

1999-04-27

Lewis, Michael

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Molecular oxygen or ozone component

423240R, 372 59, G01B 1300

Patent

active

058978470

ABSTRACT:
A method for extending the gas lifetime of an excimer laser by removing CF.sub.4 impurity, which comprises:

REFERENCES:
patent: 4392888 (1983-07-01), Eckert et al.
patent: 4796271 (1989-01-01), Christensen, Jr. et al.
patent: 5090020 (1992-02-01), Bedwell
Excimer Lasers=Current Trends and Future Directions Jan. 1989 J. Reid et al. pp. 1-8 presented at Spie O-E/Lase '89.
Laser Focus World pp. 1-4, "Chemistry studies to improve excimer gas lifetimes" Jursich et al. Jun. 1989.
"Gas Contaminants Produced in Electron-Beam-Pumped XeF Lasers" pp. 2121-2125, presented at Conf. on Lasers and Electro-optics May 12-17 1991 Kimura et al..
"Gas Contaminant effects in discharge-excited KrF lasers" Applied Optics vol. 31 No. 12 Apr. 1992.

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