Laser processing apparatus

Electric heating – Metal heating – By arc

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

359622, B23K 2600

Patent

active

058977996

ABSTRACT:
A laser processing apparatus including a laser device for emitting a first laser beam having a first cross section having a length and a width and an optical system for modifying the first laser beam to produce a second laser beam having a virtual focus. The second laser beam has a second cross section of which length is larger than the length of the first cross section and is constant with propagation of the second laser beam. The apparatus further includes a condenser located after the virtual focus for focusing the second laser beam on a specimen to be treated, wherein said second laser beam is condensed in only a widthwise direction of the cross section, and device for moving the specimen along the widthwise direction. Specifically, laser processing apparatus may include a laser device, a vertical fly-eye lens for homogenizing an intensity along a lengthwise direction of the first cross section, a mirror for directing the laser beam and cylindrical convex lens.

REFERENCES:
patent: 4309224 (1982-01-01), Shibata
patent: 4370175 (1983-01-01), Levatter
patent: 4379727 (1983-04-01), Hansen et al.
patent: 4468855 (1984-09-01), Sasaki
patent: 4473433 (1984-09-01), Bosch et al.
patent: 4475027 (1984-10-01), Pressley
patent: 4497015 (1985-01-01), Konno et al.
patent: 4500365 (1985-02-01), Mori
patent: 4662708 (1987-05-01), Bagdal
patent: 4769750 (1988-09-01), Matsumoto et al.
patent: 4773944 (1988-09-01), Fahlen et al.
patent: 4943733 (1990-07-01), Mori et al.
patent: 4970366 (1990-11-01), Imatou
patent: 4997250 (1991-03-01), Ortiz, Jr.
patent: 5307207 (1994-04-01), Ichihara
patent: 5372836 (1994-12-01), Imahashi et al.
patent: 5561081 (1996-10-01), Takenouchi et al.
English Translation of Japanese Application No. 64-76715, Publication Date of Mar. 22, 1989.
English Translation of Japanese Application No. 2-73623, Publication Date of Mar. 13, 1990.
English Translation of Japanese Application No. 3-286518, Publication Date of Dec. 17, 1991.
"P-28: 3.7-in.-Diagonal STN-LCD with Stripe Electrode Patterns Fabricated by an Excimer-Laser Scribing System" T. Konuma et al., 550 SID 93 Digest.
"High-Performance TFT's Fabricated by XeCl Excimer Laser Annealing of Hydrogenated Amorphous-Silicon Film", K. Sera et al., IEEE Transactions on Electron Devices, vol. 36, No. 12, Dec. 1989.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Laser processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Laser processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Laser processing apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-684254

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.