Plasma generating apparatus

Details Plasma generating apparatus Plasma generating apparatus

1996-09-17

1999-04-27

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

With treating means

156345, 31511151, C23C 1600

Patent

active

058977139

ABSTRACT:
A plasma generating apparatus includes a container defining a hermetic process room. The container is connected to an exhaust for exhausting an interior of the process room and setting the interior of the process room to a vacuum, and a supply for supplying a process gas into the process room. First and second coils are wound on the outer surface of the container and disposed coaxially in order to generate in the process room an electric field for converting the process gas into a plasma. The first and second coils are connected to first and second RF power supplies for respectively applying first and second RF powers. The first and second RF powers respectively have first and second frequencies. The first and second frequencies are both 2 MHz or more, and a difference between them is set to fall in a range of from 1 kHz to 2 MHz. Hence, mutual interference of the first and second RF powers generates a synthesized wave having a periodically changing amplitude. This synthesized wave generates in the process room a synthesized wave electric field to which ions in the plasma can follow.
The synthesized wave electric field is utilized for controlling progress of dissociation of the process gas in the plasma.

REFERENCES:
patent: 5146137 (1992-09-01), Gesche et al.
patent: 5401350 (1995-03-01), Patrick et al.
patent: 5554223 (1996-09-01), Imahasho
patent: 5680014 (1997-10-01), Miyamoto et al.

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