Gas and liquid contact apparatus – Contact devices – Wet baffle
Patent
1998-02-06
2000-02-29
Simmons, David A.
Gas and liquid contact apparatus
Contact devices
Wet baffle
2611145, B01F 304
Patent
active
060299568
ABSTRACT:
A predominantly liquid filled, vapor-liquid chemical reactor having an improved distributor plate assembly is disclosed. At least one of the plates in the assembly is formed with an active area having a plurality of apertures formed through the plate, an opening, and a downwardly depending lip proximate the opening. As vapor ascends through the reactor, the plate and the lip cooperate to trap the vapor upwardly against the bottom of the plate, forming a vapor region. This vapor region facilitates vapor liquid interaction and the flow pattern of liquid through the reactor.
REFERENCES:
patent: 1776032 (1930-09-01), Kobernik
patent: 2698746 (1955-01-01), Reynolds
patent: 2787453 (1957-04-01), Hibshman et al.
patent: 3143482 (1964-08-01), McLeod et al.
patent: 3464679 (1969-09-01), Becker
patent: 3920750 (1975-11-01), Katzen et al.
patent: 4247387 (1981-01-01), Akbar
patent: 4547326 (1985-10-01), Weiler
patent: 4668494 (1987-05-01), Van Hook
patent: 4784069 (1988-11-01), Stark
patent: 4816191 (1989-03-01), Berven et al.
patent: 4915061 (1990-04-01), Garcia-Mallol
patent: 5024684 (1991-06-01), Tank
patent: 5218932 (1993-06-01), Abdulally
patent: 5269976 (1993-12-01), Biddulph et al.
patent: 5325823 (1994-07-01), Garcia-Mallol
patent: 5349813 (1994-09-01), Eisinger
patent: 5489202 (1996-02-01), Eisinger
patent: 5491967 (1996-02-01), Isaksson
patent: 5500195 (1996-03-01), Garcia-Mallol
patent: 5526775 (1996-06-01), Hyppanen
patent: 5567228 (1996-10-01), Abdulally
patent: 5582515 (1996-12-01), Eisinger et al.
patent: 5601039 (1997-02-01), Hyppanen
patent: 5601788 (1997-02-01), Hyppanen et al.
patent: 5888460 (1999-03-01), Zardi et al.
Foster Wheeler USA Corporation
Hopkins Robert A.
Simmons David A.
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