High density inductively and capacitively coupled plasma chamber

Details High density inductively and capacitively coupled plasma chamber High density inductively and capacitively coupled plasma chamber

1996-05-22

1997-02-04

Kunemund, Robert

Coating apparatus

Gas or vapor deposition

With treating means

118723E, 156345, C23C 1600

Patent

active

055993966

ABSTRACT:
An inductively coupled plasma chamber having a capacitor electrode during cleaning of the plasma chamber.

REFERENCES:
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patent: 5370737 (1994-12-01), Mathis
patent: 5449410 (1995-09-01), Chang et al.
patent: 5449432 (1995-09-01), Hanawa
Andrieu, X. et al., "New Conducting Polymer Networks", Journal of Power Sources, 43-44 (1993) pp. 445-451.

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