Step and repeat apparatus having enhanced accuracy and increased

Details Step and repeat apparatus having enhanced accuracy and increased Step and repeat apparatus having enhanced accuracy and increased

1994-06-17

1998-02-03

Gonzalez, Frank

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

356375, 355 53, G01B 1100

Patent

active

057150648

ABSTRACT:
A multi-station Step and Repeat Apparatus (Stepper) for imaging semiconductor wafers. The stepper has at least 2 stations, at least one of which is for imaging. The second station may be used for image field characterization, or image defect correction, or for Phase Shift Mask (PSM) loop cutting. Multiple laser beams directed in orthogonal directions provide interferometric monitoring to track wafer locations for wafers on the stepper.

REFERENCES:
patent: 4597664 (1986-07-01), Johannsmeier et al.
patent: 4648708 (1987-03-01), Kosugi
patent: 4937618 (1990-06-01), Ayata et al.
patent: 5114234 (1992-05-01), Otsuka et al.
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5151749 (1992-09-01), Tanimoto et al.

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